Datasets:

Taylor658
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SiN-photonic-waveguide-loss-efficiency

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train · 90k rows

waveguide_width float32 0.5 2	waveguide_height float32 200 600	cladding_material stringclasses 3 values	cladding_thickness float32 1 5	deposition_method stringclasses 3 values	etch_method stringclasses 3 values	sidewall_roughness float32 0.5 5	annealing_params stringclasses 4 values	wavelength float32 1.5k 1.6k	polarization stringclasses 2 values	input_power float32 -10 10	temperature float32 20 80	bend_radius float32 20 200	device_length float32 1 50	insertion_loss float32 0.53 26.5	propagation_loss float32 0.1 5	coupling_efficiency_input float32 40 90	coupling_efficiency_output float32 40 90	scattering_loss float32 0.01 0.5	effective_index float32 1.5 2	mode_confinement_factor float32 0.7 0.95	batch_id stringclasses 50 values	data_source stringclasses 2 values	measurement_method stringclasses 4 values	uncertainty float32 0.01 0.2
1.798	579.530029	SiO2	2.25	Sputtering	RIE	3.9	900C_1hr	1,567.719971	TE	-7.53	49.509998	165.919998	19.6	3.551	0.874	51.25	55.759998	0.478	1.526	0.808	BATCH_3	Measurement	OTDR	0.03
1.586	368.600006	Polymer	1.63	LPCVD	RIE	3.55	900C_1hr	1,508.51001	TE	2.57	78.389999	142.699997	5.11	3.909	4.963	66.239998	64.120003	0.326	1.842	0.842	BATCH_8	Synthetic	ring_resonance	0.036
1.984	566.059998	SiO2	4.6	LPCVD	Wet Etch	1.13	900C_3hr	1,597.449951	TM	8.4	62.110001	175.490005	8.25	4.364	3.964	74.519997	85.650002	0.193	1.565	0.86	BATCH_1	Measurement	microring_Q	0.113
0.568	422.619995	SiO2	2.21	LPCVD	Wet Etch	1.46	1000C_1hr	1,579.25	TM	-7.91	31.52	83.720001	38.59	14.047	3.429	76.540001	79.650002	0.211	1.942	0.829	BATCH_31	Measurement	microring_Q	0.056
1.767	428.579987	Air	2.51	Sputtering	ICP	4.75	900C_1hr	1,500.77002	TE	2.58	20.9	67.919998	20.950001	8.393	3.747	68.309998	82.050003	0.354	1.621	0.767	BATCH_13	Measurement	cut-back	0.148
0.979	475.589996	Air	1.02	Sputtering	ICP	2.04	900C_3hr	1,553.27002	TM	2.52	26.1	137.539993	38.25	2.592	0.368	73.839996	80.720001	0.33	1.667	0.718	BATCH_20	Measurement	OTDR	0.035
1.326	429.73999	SiO2	3.48	Sputtering	ICP	1.7	1000C_1hr	1,539.869995	TM	-0.62	49.610001	106.150002	33.43	10.726	2.909	68.57	43.029999	0.027	1.603	0.76	BATCH_42	Synthetic	ring_resonance	0.058
1.027	403.660004	Polymer	2.51	LPCVD	Wet Etch	4.84	No_Anneal	1,590.069946	TM	4.55	42.27	196.570007	41.220001	19.993	4.53	78.870003	81.589996	0.252	1.572	0.812	BATCH_12	Measurement	OTDR	0.053
1.69	263.440002	Air	1.84	LPCVD	RIE	0.92	900C_3hr	1,541.060059	TE	-1.28	20.66	27.799999	24.74	5.53	2.005	46.150002	66.440002	0.272	1.96	0.934	BATCH_8	Measurement	microring_Q	0.072
1.154	307.190002	SiO2	2.37	PECVD	Wet Etch	0.52	No_Anneal	1,559.310059	TM	-7.82	60.080002	159.809998	8.9	2.179	1.659	66.129997	76.629997	0.498	1.734	0.78	BATCH_2	Synthetic	OTDR	0.129
1.969	212.839996	Air	4.98	PECVD	ICP	0.62	No_Anneal	1,516.540039	TM	-4.23	44.509998	126.400002	5.11	1.703	0.504	67.669998	59.849998	0.158	1.896	0.821	BATCH_22	Measurement	microring_Q	0.088
1.778	409.540009	Polymer	3.67	PECVD	Wet Etch	2.31	900C_3hr	1,505.680054	TE	9.54	21.540001	94.830002	21.66	4.798	1.563	49.150002	88.07	0.23	1.622	0.862	BATCH_18	Synthetic	cut-back	0.15
0.806	254.949997	SiO2	1.9	LPCVD	Wet Etch	0.91	No_Anneal	1,521.449951	TM	-1.42	75.68	143.690002	29.219999	3.768	0.87	76.82	84.660004	0.374	1.527	0.792	BATCH_15	Measurement	ring_resonance	0.071
1.639	260.329987	Polymer	1.53	Sputtering	Wet Etch	1.79	900C_1hr	1,581.939941	TM	-9.45	76.660004	141.419998	41.82	18.671	4.207	58.380001	77.540001	0.399	1.764	0.763	BATCH_37	Measurement	microring_Q	0.141
1.77	525.690002	Polymer	4.65	LPCVD	Wet Etch	4.88	900C_1hr	1,576.030029	TE	6.41	77.839996	76	10.12	3.819	3.223	74.940002	66.169998	0.224	1.54	0.757	BATCH_20	Measurement	cut-back	0.107
0.773	476.230011	Polymer	2.55	PECVD	Wet Etch	0.67	900C_3hr	1,588.699951	TE	9.83	75.690002	182.679993	27.25	5.251	1.504	82.440002	55.389999	0.075	1.997	0.709	BATCH_8	Measurement	ring_resonance	0.078
1.059	539.659973	Air	2.86	PECVD	ICP	0.5	1000C_1hr	1,584.839966	TE	-2.69	37.41	72.849998	33.029999	4.975	1.154	87.309998	58.75	0.17	1.852	0.882	BATCH_37	Measurement	OTDR	0.098
1.436	244.029999	Polymer	4.36	Sputtering	ICP	0.95	No_Anneal	1,508.01001	TM	-9.78	32.810001	40.119999	31.98	9.908	2.789	84.169998	48.169998	0.268	1.594	0.946	BATCH_38	Synthetic	ring_resonance	0.152
1.625	495.279999	Air	3.74	LPCVD	Wet Etch	3.93	900C_1hr	1,573.109985	TM	-9.71	49.490002	197.710007	43	14.503	2.947	41.23	68.089996	0.229	1.627	0.706	BATCH_27	Synthetic	microring_Q	0.09
1.071	554.27002	Air	2.78	LPCVD	Wet Etch	2.26	No_Anneal	1,511.209961	TM	8.57	27.370001	79.959999	30.690001	6.917	2.084	40.18	70.059998	0.349	1.572	0.94	BATCH_14	Measurement	ring_resonance	0.156
0.778	373.420013	Air	3.84	PECVD	Wet Etch	3.32	900C_3hr	1,575.459961	TM	6.58	73.900002	80.730003	49.82	19.83	3.703	76.160004	64.550003	0.048	1.954	0.851	BATCH_15	Measurement	microring_Q	0.035
0.515	509.51001	Polymer	2.8	Sputtering	ICP	2.25	1000C_1hr	1,526.01001	TE	0.36	62.200001	32.619999	21.65	10.999	4.27	42.880001	89.510002	0.09	1.93	0.919	BATCH_31	Synthetic	cut-back	0.186
1.855	443.339996	SiO2	1.98	Sputtering	Wet Etch	4.42	1000C_1hr	1,553.290039	TE	-3.63	70.290001	141.320007	35.459999	12.097	3.09	44.919998	66.050003	0.27	1.901	0.791	BATCH_11	Synthetic	OTDR	0.032
1.414	369.730011	Polymer	3.87	LPCVD	RIE	4.67	1000C_1hr	1,519.890015	TM	6.76	51.830002	73.239998	20.01	3.962	1.63	50.889999	60.919998	0.381	1.895	0.918	BATCH_8	Synthetic	ring_resonance	0.087
0.632	282.730011	Air	3.3	LPCVD	Wet Etch	2.28	1000C_1hr	1,505.25	TE	-1.03	32.880001	192.110001	39	5.966	1.189	44.619999	60.73	0.32	1.624	0.836	BATCH_48	Synthetic	microring_Q	0.156
1.112	438.359985	Air	1.26	LPCVD	RIE	0.87	900C_1hr	1,564.880005	TM	-6.84	61.810001	70.629997	26.83	3.271	0.805	78.82	69.139999	0.343	1.797	0.863	BATCH_6	Measurement	ring_resonance	0.124
1.048	454.170013	Air	2.59	Sputtering	RIE	1.49	900C_3hr	1,581.52002	TE	4.5	28.110001	163.729996	28.709999	11.374	3.413	62.599998	73.279999	0.169	1.976	0.835	BATCH_35	Synthetic	microring_Q	0.086
1.337	291.679993	SiO2	2.96	Sputtering	ICP	0.67	900C_1hr	1,582.449951	TE	-6.39	27.4	35.029999	23.969999	13.07	4.939	87.080002	54.889999	0.334	1.829	0.711	BATCH_39	Synthetic	cut-back	0.17
0.534	569.690002	Polymer	4.61	PECVD	ICP	0.9	900C_1hr	1,500.050049	TE	8.61	48.91	196.419998	45.02	11.653	2.474	78.839996	64.080002	0.407	1.676	0.904	BATCH_8	Measurement	OTDR	0.06
0.801	534.140015	Polymer	1.03	PECVD	RIE	4.87	No_Anneal	1,500.51001	TM	-0.2	49.709999	22.77	19.549999	3.955	1.353	88.040001	44.799999	0.435	1.591	0.72	BATCH_4	Measurement	microring_Q	0.048
0.97	556.650024	Polymer	1.11	PECVD	ICP	4.88	900C_3hr	1,560.089966	TE	-1.19	63.369999	117.650002	49.740002	10.218	1.901	82.410004	49.549999	0.284	1.863	0.948	BATCH_31	Measurement	microring_Q	0.161
1.865	213.449997	SiO2	4.88	Sputtering	ICP	3.08	900C_1hr	1,528.109985	TE	-5.34	47.84	184.460007	19.99	3.145	0.669	83.190002	48.580002	0.389	1.939	0.878	BATCH_5	Measurement	microring_Q	0.116
1.288	391.109985	SiO2	1.04	PECVD	ICP	3.98	1000C_1hr	1,565.23999	TE	9.63	39.639999	49.169998	13.38	2.931	1.679	54.400002	53.970001	0.266	1.632	0.741	BATCH_43	Synthetic	ring_resonance	0.167
0.931	328.959991	Air	4.38	PECVD	ICP	3.85	No_Anneal	1,505.619995	TE	-9.95	20.450001	140.490005	2.91	2.423	2.181	70.650002	83.879997	0.214	1.918	0.935	BATCH_48	Measurement	ring_resonance	0.168
0.874	279.179993	Polymer	1.29	LPCVD	RIE	1.58	No_Anneal	1,546.27002	TM	4.08	21.41	78.730003	5.09	2.041	0.611	53.32	61.529999	0.065	1.803	0.884	BATCH_26	Measurement	OTDR	0.176
1.441	554.52002	Polymer	4.8	PECVD	RIE	4.64	1000C_1hr	1,510	TM	0.54	29.889999	96.480003	36.77	13.668	3.215	73.519997	48.959999	0.401	1.775	0.848	BATCH_23	Measurement	microring_Q	0.188
1.59	561.26001	Polymer	3.9	Sputtering	Wet Etch	4.45	No_Anneal	1,550.900024	TE	9.5	40.52	136.199997	33.400002	12.852	3.633	44.650002	52.639999	0.207	1.659	0.837	BATCH_32	Measurement	microring_Q	0.047
1.268	463.920013	SiO2	3.07	Sputtering	ICP	2.36	900C_1hr	1,516.329956	TE	1.84	74.839996	75.370003	33.669998	3.91	0.868	88.089996	66.440002	0.428	1.891	0.797	BATCH_38	Measurement	microring_Q	0.179
1.452	475.149994	SiO2	2.98	Sputtering	ICP	2.44	No_Anneal	1,561.98999	TM	3.63	21.870001	72.580002	31.08	7.114	2.081	66.129997	40.669998	0.081	1.717	0.861	BATCH_47	Synthetic	ring_resonance	0.175
1.287	224.190002	Polymer	2.09	PECVD	RIE	1.16	No_Anneal	1,501.459961	TE	-7.71	70.82	75.190002	31.08	8.341	2.132	73.089996	70.269997	0.444	1.874	0.945	BATCH_7	Measurement	cut-back	0.06
0.631	475.859985	Air	1.12	Sputtering	ICP	2.95	No_Anneal	1,575.290039	TE	9.17	71.459999	65.360001	7.76	3.424	2.498	75.669998	68.199997	0.357	1.928	0.872	BATCH_27	Measurement	cut-back	0.157
0.764	360.149994	Polymer	4.45	Sputtering	Wet Etch	2.71	No_Anneal	1,575.329956	TE	7.18	35.07	89.849998	15.65	1.244	0.227	49.68	66.010002	0.019	1.628	0.723	BATCH_11	Synthetic	ring_resonance	0.09
0.874	222.220001	SiO2	2.5	LPCVD	RIE	3.19	900C_3hr	1,566.869995	TE	1.39	59.119999	172.889999	16.809999	4.711	2.375	81.379997	65.860001	0.424	1.933	0.837	BATCH_33	Synthetic	cut-back	0.092
1.386	349.619995	Polymer	2.33	PECVD	Wet Etch	2.01	900C_1hr	1,586.76001	TE	-3.32	26.15	82.309998	38.02	15.801	3.776	55.099998	89.300003	0.186	1.504	0.744	BATCH_46	Synthetic	OTDR	0.157
1.994	403.25	Polymer	3.15	LPCVD	ICP	3.76	1000C_1hr	1,591.589966	TM	5.34	53.630001	131.589996	45.25	16.965	3.56	60.459999	80.949997	0.211	1.965	0.747	BATCH_10	Measurement	OTDR	0.15
1.738	557.619995	Polymer	2.59	Sputtering	Wet Etch	1.57	900C_1hr	1,557.660034	TM	-0.9	32.639999	134.800003	43.91	7.849	1.346	66.129997	57.029999	0.419	1.58	0.882	BATCH_20	Measurement	ring_resonance	0.152
1.715	526.210022	Air	4.72	LPCVD	ICP	0.52	1000C_1hr	1,561.290039	TE	-3.15	79.82	197.149994	46.68	6.781	1.152	72.690002	75.529999	0.324	1.885	0.888	BATCH_28	Measurement	cut-back	0.156
1.744	263.700012	SiO2	1.66	Sputtering	RIE	1.95	No_Anneal	1,594.329956	TM	2.55	37.509998	20.73	25.34	8.85	2.81	79.730003	54.209999	0.357	1.571	0.941	BATCH_23	Synthetic	microring_Q	0.105
1.919	512.320007	SiO2	4.68	PECVD	RIE	2.41	1000C_1hr	1,561.47998	TM	1.05	77.099998	33.959999	9.92	5.013	4.241	62.77	74.389999	0.15	1.724	0.907	BATCH_44	Synthetic	OTDR	0.186
0.94	347.040009	SiO2	4.05	Sputtering	ICP	1.27	1000C_1hr	1,590.969971	TM	9.97	43.5	112.029999	45.490002	18.183001	3.598	43.099998	76.32	0.241	1.732	0.79	BATCH_20	Measurement	microring_Q	0.107
1.592	374.559998	Polymer	4.79	LPCVD	ICP	4.65	1000C_1hr	1,578.819946	TE	9.97	37.860001	187.350006	17.65	4.423	1.459	53.189999	45.59	0.298	1.536	0.899	BATCH_37	Measurement	ring_resonance	0.034
1.768	498.549988	SiO2	1.86	PECVD	Wet Etch	2.93	No_Anneal	1,592.75	TE	-1.98	22.24	172.479996	22.450001	4.906	1.341	67.529999	81.860001	0.188	1.68	0.871	BATCH_25	Synthetic	OTDR	0.113
1.456	245.309998	Air	1.62	LPCVD	ICP	2.64	1000C_1hr	1,516.369995	TM	8.28	36	143.449997	46.93	4.231	0.701	53.779999	83.349998	0.476	1.674	0.76	BATCH_23	Synthetic	cut-back	0.13
1.695	466.829987	Air	3.39	Sputtering	RIE	3.66	1000C_1hr	1,539.599976	TM	2.17	59.490002	116.5	38.27	14.577	3.481	69.620003	80.459999	0.192	1.726	0.756	BATCH_9	Measurement	cut-back	0.164
0.688	508.130005	SiO2	3.68	PECVD	RIE	4.46	900C_1hr	1,547.060059	TE	7.46	30.43	79.959999	29.889999	9.734	2.659	70.150002	73.230003	0.107	1.922	0.915	BATCH_43	Measurement	microring_Q	0.122
1.331	303.790009	Air	3.65	PECVD	RIE	2.52	900C_3hr	1,535.459961	TM	-2.47	54.220001	172.009995	6.42	2.325	2.72	79.040001	73.269997	0.218	1.884	0.925	BATCH_19	Synthetic	OTDR	0.012
1.097	512.76001	Air	3.17	PECVD	RIE	3.17	No_Anneal	1,538.119995	TM	0.43	46.720001	114.82	20.879999	3.097	0.741	72.239998	43.689999	0.155	1.814	0.805	BATCH_1	Synthetic	cut-back	0.086
0.559	567.26001	Polymer	4.77	PECVD	Wet Etch	3.54	900C_1hr	1,514.97998	TE	-9.35	40.490002	162.789993	27.280001	5.415	1.78	59.720001	67.779999	0.46	1.655	0.866	BATCH_44	Measurement	microring_Q	0.123
0.646	469.880005	SiO2	3.75	LPCVD	RIE	0.55	900C_3hr	1,596.310059	TM	-4.91	21.77	68.099998	7.77	2.057	1.576	56.259998	51.02	0.241	1.561	0.833	BATCH_21	Measurement	OTDR	0.086
1.169	325.190002	Air	4.33	Sputtering	ICP	4.76	No_Anneal	1,587.52002	TE	-6.17	59.830002	196.009995	45.189999	14.811	3.157	52.900002	85.980003	0.452	1.794	0.758	BATCH_25	Synthetic	OTDR	0.181
0.916	566.080017	SiO2	4.31	LPCVD	RIE	4.78	1000C_1hr	1,522.219971	TE	-6.45	43.099998	37.139999	49.16	16.556	2.982	44.16	79.800003	0.407	1.514	0.868	BATCH_41	Measurement	ring_resonance	0.026
1.758	469.779999	Polymer	4.47	PECVD	Wet Etch	3.72	900C_1hr	1,503.060059	TE	-0.2	61.25	179	46.669998	12.703	2.526	85.419998	50.599998	0.344	1.625	0.817	BATCH_32	Measurement	OTDR	0.061
1.384	589.72998	Polymer	1.54	PECVD	Wet Etch	0.91	900C_1hr	1,524.069946	TM	3.47	44.439999	62.25	36.619999	15.182	3.73	63.130001	50.98	0.03	1.75	0.854	BATCH_44	Measurement	OTDR	0.125
1.511	470.429993	Polymer	2.17	PECVD	Wet Etch	0.55	900C_1hr	1,511.079956	TM	9.91	61.98	107.839996	6.8	3.707	4.114	85.660004	73.580002	0.113	1.937	0.939	BATCH_38	Synthetic	OTDR	0.095
0.889	560.080017	Polymer	1.29	LPCVD	Wet Etch	2.71	900C_3hr	1,559.939941	TE	-2.47	43.759998	136.490005	40.060001	5.553	0.932	44.689999	71.690002	0.222	1.881	0.909	BATCH_41	Synthetic	cut-back	0.13
1.312	277.570007	Air	2.25	PECVD	ICP	2.67	900C_3hr	1,558.109985	TM	-7.28	78.239998	187.509995	14.91	2.775	1.369	85.400002	54.650002	0.381	1.779	0.739	BATCH_8	Synthetic	microring_Q	0.186
1.018	278.799988	Polymer	3.26	PECVD	Wet Etch	0.92	No_Anneal	1,530.530029	TM	7.78	49.220001	37.419998	26.01	13.823	4.564	56.369999	66.800003	0.462	1.658	0.79	BATCH_48	Synthetic	microring_Q	0.172
1.221	495.799988	SiO2	1.12	PECVD	RIE	2.97	No_Anneal	1,563.329956	TM	-6.54	54.91	21.84	11.58	1.837	0.265	40.439999	73.480003	0.189	1.96	0.745	BATCH_47	Synthetic	OTDR	0.192
1.374	234.229996	Air	4.96	PECVD	ICP	2.74	1000C_1hr	1,584.680054	TM	-3.99	61.939999	63.330002	14.24	1.747	0.326	60.349998	68.419998	0.042	1.706	0.816	BATCH_24	Measurement	cut-back	0.089
1.128	384.470001	SiO2	2.01	PECVD	RIE	3.09	900C_1hr	1,543.959961	TE	7.38	21.940001	73.209999	49.09	21.909	4.351	53.119999	40.07	0.389	1.897	0.891	BATCH_13	Synthetic	OTDR	0.098
1.191	400.859985	SiO2	4.96	Sputtering	ICP	4.88	900C_3hr	1,529.420044	TE	-4.29	26.67	79.169998	28.34	9.818	3.102	60.52	47.970001	0.233	1.953	0.916	BATCH_3	Measurement	ring_resonance	0.132
1.319	598.98999	Air	4.53	Sputtering	Wet Etch	4.68	900C_3hr	1,596.530029	TE	-2.18	61.490002	134.740005	25.120001	10.476	3.716	82.25	82.220001	0.267	1.872	0.868	BATCH_4	Synthetic	cut-back	0.014
1.929	328.700012	Polymer	2.6	LPCVD	RIE	1.54	1000C_1hr	1,510.719971	TE	-0.36	36.779999	146.009995	42.880001	9.239	1.875	85.010002	65.279999	0.316	1.728	0.897	BATCH_49	Synthetic	ring_resonance	0.118
1.857	438.290009	SiO2	2.05	LPCVD	RIE	3.24	900C_3hr	1,540.640015	TE	-7.09	41.330002	24.91	30.93	13.795	4.249	84.620003	64.269997	0.074	1.602	0.829	BATCH_9	Synthetic	ring_resonance	0.06
1.199	367.929993	Air	2.77	LPCVD	RIE	3.72	900C_1hr	1,584.900024	TM	6.88	54.68	130.679993	31.58	14.801	4.207	75.260002	42.990002	0.36	1.553	0.889	BATCH_26	Synthetic	microring_Q	0.034
1.602	392.839996	Air	4.59	Sputtering	RIE	3.49	1000C_1hr	1,522.199951	TE	7.43	30.209999	164.479996	27.530001	5.878	1.687	41.459999	47.330002	0.019	1.619	0.799	BATCH_35	Synthetic	ring_resonance	0.196
1.231	373.179993	Air	3.51	Sputtering	RIE	2.56	900C_3hr	1,567.180054	TM	-7.6	73.230003	93.300003	4.46	2.239	0.895	55.630001	74.699997	0.155	1.578	0.895	BATCH_33	Synthetic	cut-back	0.185
1.358	254.330002	Air	4.87	PECVD	Wet Etch	4.44	No_Anneal	1,544.819946	TE	-3.78	53.150002	123.589996	4.22	2.552	1.629	62.25	52.209999	0.075	1.945	0.904	BATCH_27	Measurement	ring_resonance	0.071
1.248	550.909973	Polymer	1.82	Sputtering	RIE	0.86	900C_1hr	1,565.180054	TM	7.57	33.580002	166.440002	23.620001	7.153	2.331	88.900002	66.650002	0.073	1.649	0.702	BATCH_23	Synthetic	OTDR	0.136
1.406	593.01001	SiO2	4.16	PECVD	ICP	1.23	1000C_1hr	1,593.650024	TM	-2.23	59.849998	131.580002	32.32	14.653	4.156	53.650002	81.120003	0.205	1.669	0.728	BATCH_18	Measurement	cut-back	0.198
1.777	411.76001	SiO2	1.06	LPCVD	ICP	1.73	900C_1hr	1,539.5	TE	9.42	46.27	83.790001	24.379999	9.057	3.167	50.650002	62.419998	0.024	1.979	0.714	BATCH_36	Synthetic	ring_resonance	0.035
1.933	585.690002	Air	1.69	PECVD	ICP	4.55	900C_1hr	1,593.560059	TE	7.76	69.900002	107.790001	19.83	1.874	0.55	57.400002	81.769997	0.24	1.513	0.87	BATCH_11	Measurement	ring_resonance	0.12
0.924	316.320007	SiO2	3.36	PECVD	Wet Etch	3.23	900C_1hr	1,518.170044	TM	-6.83	61	88.919998	29.120001	10.486	3.31	48.560001	87.720001	0.035	1.907	0.891	BATCH_3	Synthetic	microring_Q	0.053
1.107	452.880005	SiO2	4.99	Sputtering	Wet Etch	1.18	1000C_1hr	1,531.130005	TM	-2.56	52.709999	31.23	21.879999	9.084	3.653	75.889999	57.279999	0.142	1.881	0.928	BATCH_10	Measurement	cut-back	0.159
1.685	464.429993	Polymer	2.73	LPCVD	Wet Etch	4.81	1000C_1hr	1,578.589966	TM	9.62	43.18	32.939999	16.459999	2.942	0.776	42.84	49.16	0.045	1.996	0.859	BATCH_39	Measurement	OTDR	0.013
1.654	318.410004	Polymer	3.99	Sputtering	RIE	3.41	900C_1hr	1,503.47998	TM	-0.6	34.189999	52.389999	2.9	2	4.691	66.230003	60.82	0.059	1.986	0.913	BATCH_4	Synthetic	microring_Q	0.143
1.767	281.359985	Air	2.18	Sputtering	Wet Etch	3.94	900C_3hr	1,508.530029	TM	-9.79	77.209999	80.589996	35.91	18.226999	4.894	78.290001	68.769997	0.028	1.755	0.7	BATCH_9	Measurement	microring_Q	0.134
1.648	342.98999	Air	1.79	PECVD	RIE	4.29	900C_1hr	1,502.910034	TE	-5.88	24.129999	128.649994	2.33	2.17	2.789	89.190002	78.800003	0.468	1.668	0.84	BATCH_45	Synthetic	OTDR	0.138
1.906	548.830017	Air	4.83	LPCVD	Wet Etch	0.59	900C_3hr	1,565.219971	TE	8.94	31.879999	198.929993	37.23	7.326	1.726	50.580002	88.089996	0.401	1.709	0.779	BATCH_1	Synthetic	ring_resonance	0.153
1.971	346.089996	Polymer	4.51	Sputtering	Wet Etch	0.55	900C_3hr	1,577.599976	TE	3.3	29.85	35.110001	4.29	3.877	4.845	80.059998	55.5	0.169	1.922	0.9	BATCH_32	Synthetic	OTDR	0.131
0.789	222.479996	SiO2	4.04	Sputtering	ICP	1.05	900C_3hr	1,578.060059	TE	-8.79	20.809999	26.48	40.66	3.745	0.647	43.720001	52.400002	0.294	1.904	0.936	BATCH_7	Synthetic	ring_resonance	0.156
1.439	367.179993	SiO2	1.98	PECVD	Wet Etch	3.57	900C_3hr	1,527.099976	TE	2.16	54.889999	146.029999	47.41	6.437	1.032	64.870003	46.91	0.379	1.531	0.817	BATCH_48	Synthetic	microring_Q	0.199
1.989	491.920013	Air	4.25	Sputtering	RIE	2.61	900C_1hr	1,598.459961	TE	2.09	43.869999	184.520004	18.27	8.059	3.341	57.099998	84.050003	0.105	1.63	0.82	BATCH_24	Synthetic	ring_resonance	0.068
1.439	409.459991	SiO2	4.39	PECVD	ICP	2.24	900C_1hr	1,577.449951	TM	2.52	69.980003	172.979996	15.26	3.741	1.945	83.650002	52.470001	0.058	1.666	0.898	BATCH_2	Synthetic	ring_resonance	0.115
1.315	307.269989	SiO2	3.79	PECVD	Wet Etch	2.79	No_Anneal	1,508.170044	TE	-0.62	39.27	163.389999	14.55	5.256	3.114	67.5	60.25	0.132	1.904	0.93	BATCH_6	Measurement	ring_resonance	0.122
1.788	270.309998	Air	2.74	LPCVD	RIE	3.38	900C_3hr	1,541.26001	TM	-9.1	63.799999	192.669998	22.84	3.274	0.629	47.16	50.57	0.451	1.511	0.726	BATCH_48	Measurement	OTDR	0.12
1.513	398.480011	SiO2	3.83	LPCVD	RIE	0.68	900C_1hr	1,525.069946	TM	0.68	22.969999	24.459999	35.82	15.125	3.731	89.389999	40.189999	0.274	1.737	0.782	BATCH_9	Measurement	OTDR	0.042
0.723	520.799988	Air	3.59	LPCVD	RIE	4	No_Anneal	1,540.109985	TM	3.02	31.219999	34.77	38.080002	3.249	0.354	53.040001	88.290001	0.415	1.511	0.805	BATCH_3	Synthetic	ring_resonance	0.135
1.206	507.019989	Polymer	4.65	LPCVD	ICP	3.2	1000C_1hr	1,502.880005	TE	-5.31	35.599998	22.17	34.040001	16.757	4.393	52.400002	56.459999	0.346	1.643	0.881	BATCH_38	Synthetic	cut-back	0.108
0.793	511.049988	Air	2.15	PECVD	Wet Etch	1.28	900C_1hr	1,511.430054	TM	-7.79	20.09	60.939999	18.790001	10.791	4.874	49.860001	54.41	0.486	1.777	0.911	BATCH_31	Synthetic	microring_Q	0.05