waveguide_width
float32
0.5
2
waveguide_height
float32
200
600
cladding_material
stringclasses
3 values
cladding_thickness
float32
1
5
deposition_method
stringclasses
3 values
etch_method
stringclasses
3 values
sidewall_roughness
float32
0.5
5
annealing_params
stringclasses
4 values
wavelength
float32
1.5k
1.6k
polarization
stringclasses
2 values
input_power
float32
-10
10
temperature
float32
20
80
bend_radius
float32
20
200
device_length
float32
1
50
insertion_loss
float32
0.53
26.5
propagation_loss
float32
0.1
5
coupling_efficiency_input
float32
40
90
coupling_efficiency_output
float32
40
90
scattering_loss
float32
0.01
0.5
effective_index
float32
1.5
2
mode_confinement_factor
float32
0.7
0.95
batch_id
stringclasses
50 values
data_source
stringclasses
2 values
measurement_method
stringclasses
4 values
uncertainty
float32
0.01
0.2
0.663
527.219971
Air
1.08
LPCVD
RIE
0.6
900C_1hr
1,578.670044
TE
-7.61
65.510002
150.869995
32.889999
3.687
0.584
89.57
52.610001
0.392
1.595
0.827
BATCH_37
Measurement
OTDR
0.151
1.246
532
Air
3.35
Sputtering
ICP
1.62
900C_1hr
1,542.949951
TM
-6.01
57.709999
68.370003
29.1
10.55
3.389
79.949997
45.619999
0.023
1.557
0.824
BATCH_23
Synthetic
microring_Q
0.098
0.755
323.630005
SiO2
4.45
PECVD
RIE
3.83
1000C_1hr
1,508.900024
TM
-5.94
55.830002
143.550003
5.08
2.599
2.965
68.089996
81.32
0.025
1.635
0.838
BATCH_3
Synthetic
cut-back
0.082
1.67
506.220001
Air
3.75
Sputtering
ICP
4.27
900C_1hr
1,506.5
TE
3.98
53.459999
191.970001
35.470001
9.543
2.383
77.510002
50.450001
0.168
1.692
0.759
BATCH_15
Synthetic
ring_resonance
0.136
1.968
289.790009
Polymer
2.55
Sputtering
RIE
2.82
900C_1hr
1,540.959961
TM
-6.23
23.58
192.440002
4.58
3.121
3.458
65.75
56.990002
0.272
1.589
0.909
BATCH_5
Measurement
microring_Q
0.045
1.654
343.589996
Polymer
1.06
LPCVD
RIE
4.31
No_Anneal
1,526.72998
TM
-7.26
56.779999
133.520004
31.85
2.375
0.176
72.239998
54.950001
0.051
1.839
0.822
BATCH_26
Measurement
cut-back
0.087
0.901
275.109985
Air
1.34
LPCVD
ICP
1.74
900C_1hr
1,554.849976
TM
-6.17
53.060001
96.949997
14.65
2.957
1.016
86.150002
82.730003
0.38
1.818
0.796
BATCH_22
Measurement
cut-back
0.167
1.428
593.599976
Air
3.81
Sputtering
RIE
2.7
900C_1hr
1,564.02002
TE
0.47
49.560001
79.089996
12.82
2.827
0.679
86.540001
89.75
0.292
1.653
0.752
BATCH_44
Measurement
OTDR
0.053
1.483
387.709991
Air
3.84
LPCVD
ICP
1.69
900C_1hr
1,517.170044
TM
-2.77
52.43
155.720001
21.35
6.03
2.194
59.939999
83.949997
0.087
1.726
0.92
BATCH_19
Measurement
ring_resonance
0.023
1.208
465.76001
SiO2
3.43
LPCVD
RIE
1.64
900C_3hr
1,583.689941
TE
-5.33
66.389999
162.309998
12.77
4.787
2.329
63.139999
72.309998
0.191
1.885
0.798
BATCH_38
Synthetic
OTDR
0.071
1.719
424.01001
Air
4.59
PECVD
RIE
3.43
900C_3hr
1,542.089966
TM
3.85
40.459999
24.190001
45.599998
7.551
1.4
60.169998
80.260002
0.482
1.614
0.921
BATCH_22
Measurement
cut-back
0.142
1.926
438.769989
Polymer
4.43
PECVD
ICP
2.51
No_Anneal
1,537.27002
TE
-4.16
59.709999
26.59
47.009998
16.572001
3.102
49.040001
84.419998
0.253
1.644
0.732
BATCH_9
Synthetic
OTDR
0.102
0.752
588.710022
SiO2
1.4
PECVD
Wet Etch
1.26
No_Anneal
1,564.569946
TM
-8.65
72.010002
159.610001
28.65
10.18
2.87
44.169998
63.25
0.48
1.899
0.927
BATCH_6
Measurement
microring_Q
0.169
0.82
239
Polymer
3.9
PECVD
Wet Etch
3.89
900C_1hr
1,522.359985
TE
2.35
68.089996
63.959999
5.41
3.645
3.915
59.560001
62.549999
0.032
1.729
0.764
BATCH_45
Synthetic
microring_Q
0.147
0.532
264.359985
SiO2
1.06
LPCVD
ICP
4.16
No_Anneal
1,538.790039
TM
-6.77
26.950001
29.5
39.240002
9.282
2.039
81.150002
50.400002
0.042
1.674
0.87
BATCH_17
Measurement
OTDR
0.174
1.616
311.799988
Air
3.02
PECVD
Wet Etch
0.58
1000C_1hr
1,533.48999
TM
-1.8
44.93
38.720001
11.32
6.845
4.536
58.540001
70.260002
0.112
1.883
0.736
BATCH_28
Measurement
OTDR
0.094
0.766
380.559998
SiO2
2.7
LPCVD
ICP
0.95
900C_1hr
1,569.859985
TE
-3.71
46.419998
67.790001
34.990002
5.328
1.099
74.089996
78.68
0.185
1.848
0.733
BATCH_13
Measurement
OTDR
0.12
0.905
210.830002
Polymer
2.37
PECVD
Wet Etch
2.31
900C_3hr
1,511.420044
TE
-5.16
30.030001
72.230003
45.41
10.023
1.861
84.330002
51.959999
0.269
1.544
0.935
BATCH_45
Measurement
microring_Q
0.143
1.038
395.690002
Polymer
4.41
Sputtering
RIE
4.19
900C_3hr
1,545.48999
TM
-6.64
28.200001
145.679993
29.219999
12.599
4.11
78.93
40.639999
0.197
1.762
0.787
BATCH_10
Measurement
OTDR
0.018
1.753
536.22998
SiO2
3.65
PECVD
RIE
2.48
900C_3hr
1,520.920044
TE
-5.57
22.15
166.029999
19.709999
5.816
2.107
46.34
40.91
0.229
1.775
0.84
BATCH_50
Measurement
ring_resonance
0.115
1.386
233.630005
Polymer
2.65
PECVD
RIE
3.36
900C_1hr
1,557.48999
TM
0.68
70.279999
168.199997
28.6
14.47
4.685
40.099998
47.540001
0.315
1.52
0.794
BATCH_17
Measurement
microring_Q
0.066
1.447
562.539978
SiO2
2.97
Sputtering
ICP
4.11
900C_3hr
1,537.369995
TE
-3.08
28.389999
114.779999
34.169998
6.386
1.703
89.260002
57.91
0.395
1.593
0.806
BATCH_21
Measurement
OTDR
0.13
1.671
388.019989
Polymer
1.76
Sputtering
RIE
3.17
900C_3hr
1,597.01001
TE
-5.56
72.940002
152.470001
10.36
2.171
0.175
45.73
60.23
0.034
1.595
0.881
BATCH_38
Measurement
cut-back
0.051
0.979
545.440002
SiO2
4.72
PECVD
Wet Etch
4.57
900C_3hr
1,570.650024
TE
-7.76
35.34
196.009995
30.34
14.377
4.535
79.809998
40.639999
0.414
1.79
0.839
BATCH_3
Synthetic
cut-back
0.072
1.072
325.029999
Polymer
3.89
LPCVD
ICP
0.96
No_Anneal
1,583.369995
TE
3.48
69.870003
101.300003
9.86
2.53
1.478
56.23
52.209999
0.105
1.586
0.773
BATCH_41
Synthetic
microring_Q
0.025
0.884
295.269989
Air
3.87
LPCVD
RIE
2.76
900C_3hr
1,599.800049
TM
2.98
56.400002
60.869999
8.69
1.268
0.485
65.370003
80.220001
0.382
1.913
0.92
BATCH_34
Measurement
microring_Q
0.113
1.281
331.369995
SiO2
2.94
PECVD
Wet Etch
4.91
No_Anneal
1,561.01001
TE
3.28
64.940002
130.889999
8.25
5.135
4.553
81.150002
84.099998
0.322
1.972
0.921
BATCH_34
Synthetic
microring_Q
0.142
1.631
383.079987
Polymer
2.15
LPCVD
Wet Etch
0.53
900C_1hr
1,547.300049
TM
7.7
65.099998
80.769997
16.83
6.746
2.957
89.260002
49.779999
0.453
1.505
0.758
BATCH_11
Measurement
OTDR
0.04
1.803
548.700012
SiO2
2.68
PECVD
Wet Etch
3.27
900C_1hr
1,560.680054
TE
-8.88
76.68
46.380001
26.610001
3.666
1.096
82.879997
54.369999
0.282
1.918
0.793
BATCH_26
Synthetic
cut-back
0.098
0.528
555.169983
Polymer
3.68
PECVD
Wet Etch
1.21
900C_3hr
1,568.060059
TE
6.06
42.57
159.779999
47.860001
2.108
0.146
64.089996
71.540001
0.143
1.578
0.776
BATCH_48
Synthetic
cut-back
0.098
1.875
503.809998
Polymer
1.6
PECVD
Wet Etch
4.4
No_Anneal
1,594.579956
TM
-4.11
40.77
101.089996
10.32
1.92
0.705
41.119999
40.450001
0.354
1.678
0.788
BATCH_5
Synthetic
microring_Q
0.102
1.602
201.820007
Air
1.91
LPCVD
Wet Etch
1.91
No_Anneal
1,557.27002
TE
0.45
24.879999
166.630005
31.26
6.71
1.552
43.57
68.669998
0.205
1.666
0.94
BATCH_25
Measurement
microring_Q
0.175
1.168
447.029999
Air
2.79
PECVD
Wet Etch
3.23
900C_3hr
1,563.390015
TE
9.07
47.52
78.480003
9.37
5.298
3.57
74.209999
53.889999
0.49
1.664
0.946
BATCH_15
Measurement
cut-back
0.092
1.62
282.649994
Polymer
4.73
LPCVD
ICP
1.54
No_Anneal
1,513.719971
TM
-8.44
41.830002
65.160004
20.110001
8.411
3.787
73.360001
83.290001
0.443
1.895
0.762
BATCH_35
Synthetic
ring_resonance
0.177
0.635
395.959991
Air
2.55
Sputtering
ICP
1.45
1000C_1hr
1,588.410034
TM
7.54
35.77
75.910004
13.4
3.487
1.463
84.099998
46.860001
0.13
1.949
0.927
BATCH_37
Measurement
ring_resonance
0.17
1.161
317.609985
Air
3.34
Sputtering
ICP
2.52
1000C_1hr
1,577.560059
TM
-8.94
40.93
108.82
16.139999
7.945
3.885
70.260002
53.07
0.283
1.854
0.737
BATCH_23
Measurement
cut-back
0.061
1.223
451.700012
Air
4.56
PECVD
Wet Etch
2.23
1000C_1hr
1,573.170044
TE
-4.45
72.410004
77.089996
25.129999
4.678
1.458
77.059998
89.879997
0.354
1.54
0.757
BATCH_2
Synthetic
ring_resonance
0.097
1.973
555.840027
Polymer
4.59
Sputtering
Wet Etch
0.78
No_Anneal
1,502.280029
TM
8.91
30.860001
32.889999
20.559999
1.917
0.267
78.580002
51.48
0.203
1.696
0.803
BATCH_20
Measurement
cut-back
0.075
1.141
576.820007
SiO2
3.53
PECVD
ICP
3.92
No_Anneal
1,569.25
TM
5.95
58.950001
184.729996
38.700001
2.554
0.152
53.049999
66.419998
0.495
1.627
0.788
BATCH_29
Synthetic
microring_Q
0.095
0.908
371
Air
1.52
LPCVD
RIE
1.57
1000C_1hr
1,546.209961
TE
2.18
55.150002
167.919998
19.040001
3.871
1.568
75.339996
70.879997
0.28
1.592
0.745
BATCH_39
Measurement
cut-back
0.138
0.628
290.130005
SiO2
4.1
LPCVD
ICP
3.52
1000C_1hr
1,519.849976
TM
-7.74
20.85
198.839996
31.27
4.341
1.12
80.889999
51.130001
0.231
1.719
0.896
BATCH_46
Synthetic
OTDR
0.124
1.246
271.179993
Air
4.19
Sputtering
RIE
4.91
1000C_1hr
1,502.930054
TM
0.3
62.57
50.43
26.82
3.095
0.543
42.82
46.709999
0.242
1.793
0.929
BATCH_3
Synthetic
OTDR
0.017
1.32
268.75
Air
4.53
LPCVD
Wet Etch
0.91
900C_1hr
1,539.079956
TM
-1.45
26.58
25.26
8.39
3.79
3.226
88.32
55.709999
0.012
1.884
0.926
BATCH_11
Synthetic
OTDR
0.046
0.905
368.75
Polymer
2.7
PECVD
ICP
2.89
900C_1hr
1,530.439941
TM
1.8
66.940002
188.220001
1.82
1.523
1.494
43.669998
61.959999
0.487
1.824
0.777
BATCH_26
Synthetic
ring_resonance
0.045
1.298
554.599976
Polymer
4.72
LPCVD
ICP
3.15
900C_3hr
1,515.930054
TE
2.17
68.910004
179.789993
13.54
7.321
4.727
47.84
49.549999
0.046
1.984
0.884
BATCH_14
Synthetic
microring_Q
0.115
1.353
377.029999
Air
1.07
LPCVD
ICP
2.48
900C_1hr
1,516.76001
TE
7.52
24.700001
88.519997
27.879999
2.903
0.568
82.220001
70.339996
0.323
1.958
0.733
BATCH_43
Measurement
ring_resonance
0.024
1.703
220.949997
SiO2
2
LPCVD
RIE
3.71
900C_1hr
1,587.069946
TE
9.45
39.209999
198.389999
33.5
8.01
2.031
60.91
70.120003
0.139
1.956
0.933
BATCH_34
Synthetic
cut-back
0.159
1.297
221.399994
SiO2
1.62
LPCVD
Wet Etch
0.85
1000C_1hr
1,559.319946
TE
-7.58
23.08
195.100006
44.040001
12.671
2.699
89.879997
82.190002
0.098
1.587
0.91
BATCH_16
Synthetic
microring_Q
0.154
1.35
326.619995
SiO2
2.21
LPCVD
Wet Etch
3.34
No_Anneal
1,504.290039
TE
-3.45
61.439999
41.970001
11.15
5.127
2.828
71.190002
58.02
0.403
1.507
0.73
BATCH_17
Synthetic
microring_Q
0.193
1.124
420.109985
Air
2.04
PECVD
RIE
1.7
1000C_1hr
1,598.22998
TE
6.07
78.260002
47.990002
47.849998
18.966999
3.776
42.25
73.43
0.351
1.778
0.921
BATCH_19
Measurement
microring_Q
0.076
1.64
583.210022
Polymer
3.45
Sputtering
ICP
4.55
No_Anneal
1,538.790039
TE
-6.84
20.73
186.5
18.860001
7.668
3.456
44.900002
74.220001
0.3
1.914
0.815
BATCH_18
Synthetic
OTDR
0.066
1.661
501.600006
Polymer
4.55
PECVD
Wet Etch
3.59
No_Anneal
1,559.25
TM
4.58
73.919998
87.769997
14.19
1.859
0.153
57.09
70.089996
0.414
1.792
0.889
BATCH_19
Measurement
ring_resonance
0.099
1.017
474.429993
Polymer
1.91
PECVD
RIE
1.9
900C_1hr
1,543.089966
TM
-3.29
46.470001
126.339996
9.95
1.92
0.537
56.189999
44.869999
0.118
1.919
0.926
BATCH_39
Measurement
ring_resonance
0.152
1.357
400.119995
Air
1.14
PECVD
Wet Etch
3.08
1000C_1hr
1,554.439941
TM
-1.96
20.309999
189.830002
7.19
2.762
1.253
81.639999
42.849998
0.364
1.622
0.908
BATCH_45
Synthetic
OTDR
0.046
1.998
318.779999
SiO2
1.32
LPCVD
ICP
3.92
No_Anneal
1,568.040039
TE
-2.52
26.889999
83.580002
5.4
2.113
1.794
48.07
58.389999
0.054
1.919
0.806
BATCH_47
Measurement
cut-back
0.089
1.387
560.960022
Polymer
3.59
Sputtering
Wet Etch
4.34
No_Anneal
1,591.23999
TE
7.24
22.32
130.460007
28.129999
4.817
1.098
54.869999
86.080002
0.073
1.987
0.735
BATCH_45
Synthetic
OTDR
0.134
1.017
513.609985
SiO2
2.37
LPCVD
RIE
4.08
900C_3hr
1,524.300049
TM
-4.85
32.880001
99.419998
42.880001
12.361
2.579
43.98
85.510002
0.36
1.586
0.864
BATCH_12
Measurement
microring_Q
0.104
1.282
379.040009
Polymer
3.95
LPCVD
Wet Etch
0.51
900C_3hr
1,558.030029
TM
-8.02
78.650002
111.519997
47.130001
20.554001
3.97
56.43
59.77
0.256
1.748
0.74
BATCH_48
Measurement
ring_resonance
0.017
0.764
467.380005
Polymer
4.21
Sputtering
RIE
3.21
1000C_1hr
1,560.550049
TM
-3.86
57.990002
84.599998
47.77
21.856001
4.195
87.379997
60.18
0.059
1.823
0.923
BATCH_38
Measurement
microring_Q
0.139
1.998
321.859985
Air
2.03
Sputtering
RIE
1.86
No_Anneal
1,570.859985
TM
-2.56
44.450001
53.48
9.19
4.638
4.186
55.68
59.07
0.484
1.875
0.86
BATCH_15
Synthetic
cut-back
0.172
1.309
313.309998
SiO2
3.92
LPCVD
ICP
4.43
900C_3hr
1,516.089966
TE
-7.58
67.93
180.050003
18.610001
5.388
2.258
84.279999
42.41
0.489
1.802
0.751
BATCH_38
Measurement
ring_resonance
0.13
0.915
430.850006
SiO2
4.94
Sputtering
RIE
2.99
900C_3hr
1,543.180054
TE
7.12
41.790001
26.700001
2.93
2.401
4.391
58.669998
40.09
0.252
1.814
0.759
BATCH_10
Measurement
microring_Q
0.078
1.847
528.530029
SiO2
3.58
LPCVD
ICP
4.64
No_Anneal
1,566.040039
TM
-3.43
30.32
81.400002
14.13
6.865
4.004
50.549999
43.470001
0.405
1.928
0.814
BATCH_31
Synthetic
cut-back
0.015
0.782
241.960007
SiO2
2.38
Sputtering
Wet Etch
3.39
No_Anneal
1,531.73999
TE
-2.34
57
159.199997
20.99
7.697
2.949
49.139999
50.84
0.453
1.915
0.837
BATCH_11
Synthetic
ring_resonance
0.095
1.524
368.859985
Polymer
4.85
Sputtering
RIE
3.02
900C_1hr
1,583.609985
TE
8.37
72.580002
99.489998
47.869999
11.033
1.98
72.839996
47.310001
0.068
1.694
0.753
BATCH_9
Synthetic
OTDR
0.069
1.756
550.200012
SiO2
3.17
LPCVD
ICP
3.9
900C_1hr
1,511.869995
TM
9.42
64.559998
68.629997
11.99
2.464
0.646
47.650002
58.299999
0.222
1.889
0.855
BATCH_9
Measurement
cut-back
0.065
0.907
359.179993
Air
4.4
PECVD
Wet Etch
4.65
No_Anneal
1,501.430054
TM
-9.72
36.009998
104
31.66
8.389
2.16
47.59
86.989998
0.011
1.594
0.895
BATCH_19
Synthetic
microring_Q
0.19
1.616
210.100006
Air
2.42
LPCVD
ICP
1.76
1000C_1hr
1,517
TM
-8.85
36.389999
127.32
17.15
4.353
1.934
61
67.709999
0.23
1.61
0.933
BATCH_39
Measurement
ring_resonance
0.044
1.084
239.820007
Polymer
4
Sputtering
RIE
1.54
900C_3hr
1,597.01001
TE
-9.68
39.299999
196.089996
45.849998
10.412
2.151
86.330002
72.059998
0.487
1.794
0.735
BATCH_1
Measurement
ring_resonance
0.036
0.514
404.350006
Air
1.87
Sputtering
Wet Etch
2.78
900C_3hr
1,587.689941
TM
-9.69
39.68
38.209999
16.75
8.78
4.307
41.93
52.639999
0.343
1.861
0.721
BATCH_15
Measurement
microring_Q
0.086
1.38
353.429993
SiO2
1.08
LPCVD
Wet Etch
3.67
900C_1hr
1,501.030029
TE
7.85
23.129999
57.34
40.799999
4.751
0.945
72.120003
60.099998
0.373
1.933
0.881
BATCH_11
Synthetic
microring_Q
0.104
1.57
414.140015
Polymer
3.12
Sputtering
ICP
0.56
900C_3hr
1,540.069946
TE
-9.31
74.269997
131.279999
13.43
6.501
3.963
57.810001
80.690002
0.429
1.774
0.883
BATCH_26
Synthetic
cut-back
0.056
1.231
353.609985
Polymer
4.35
PECVD
ICP
4.45
900C_3hr
1,528.359985
TM
5.61
44.400002
166.929993
4.83
2.177
2.103
79.199997
43.09
0.387
1.782
0.845
BATCH_49
Synthetic
ring_resonance
0.062
0.613
232.039993
Polymer
2.22
Sputtering
ICP
2.05
900C_1hr
1,585.609985
TM
-9.82
77.800003
139.300003
27.469999
6.038
1.774
46.82
46.400002
0.174
1.923
0.937
BATCH_7
Synthetic
microring_Q
0.164
1.389
332.76001
Polymer
3.78
LPCVD
ICP
4.78
No_Anneal
1,525.449951
TM
-0.27
54.849998
193.229996
28.620001
13.063
3.867
61.169998
84.349998
0.097
1.564
0.71
BATCH_7
Measurement
microring_Q
0.013
1.12
417.290009
Air
1.83
Sputtering
RIE
3.77
1000C_1hr
1,588.199951
TE
-0.59
74.910004
60.759998
5.76
3.677
4.472
68.059998
49.639999
0.047
1.769
0.706
BATCH_29
Synthetic
ring_resonance
0.154
0.646
432.779999
Polymer
4.38
PECVD
RIE
1.11
900C_3hr
1,521.569946
TM
-7.11
35.529999
113.129997
5.86
3.12
2.19
41.07
51.139999
0.426
1.661
0.862
BATCH_35
Synthetic
microring_Q
0.098
0.725
200.509995
Polymer
1.96
PECVD
ICP
2.66
900C_3hr
1,501.810059
TM
2.84
73.900002
90.559998
41.040001
2.49
0.152
88.230003
40.740002
0.219
1.643
0.82
BATCH_40
Synthetic
microring_Q
0.192
1.584
387.359985
SiO2
2.76
Sputtering
Wet Etch
2.78
1000C_1hr
1,541.280029
TM
-3.98
44.810001
89.25
44
9.903
2.121
85.75
76.580002
0.464
1.774
0.921
BATCH_44
Synthetic
OTDR
0.028
1.521
578.280029
SiO2
2.39
Sputtering
Wet Etch
1.35
No_Anneal
1,580.540039
TE
6.49
67.779999
115.160004
4.85
3.518
3.486
56
70.309998
0.497
1.625
0.735
BATCH_32
Measurement
cut-back
0.074
1.605
421.320007
Air
3.03
PECVD
RIE
1.1
900C_1hr
1,543.949951
TE
4.33
24.82
149.509995
31.27
8.335
2.151
76.730003
55.27
0.269
1.93
0.877
BATCH_28
Measurement
microring_Q
0.113
0.815
302.049988
Air
2.29
LPCVD
RIE
3.59
900C_1hr
1,544.76001
TE
-2.22
42.990002
138.429993
22.35
11.866
4.479
84.779999
43.919998
0.105
1.589
0.777
BATCH_1
Measurement
microring_Q
0.153
1.934
272.320007
SiO2
2.78
LPCVD
Wet Etch
3.91
1000C_1hr
1,538.780029
TM
-7.55
20.389999
144.190002
33.189999
13.821
3.859
83.93
81.849998
0.264
1.922
0.89
BATCH_33
Synthetic
ring_resonance
0.129
1.441
490.130005
SiO2
2.22
PECVD
Wet Etch
1.09
900C_1hr
1,507.540039
TM
-1.59
66.940002
80.32
7.52
1.109
0.655
73.879997
82
0.304
1.844
0.707
BATCH_39
Measurement
cut-back
0.133
0.989
540.969971
SiO2
4.39
PECVD
ICP
4.34
1000C_1hr
1,524.109985
TE
-1.97
27.65
71.910004
38.919998
8.382
2.021
48.689999
71.410004
0.456
1.775
0.767
BATCH_1
Measurement
cut-back
0.14
0.514
466.779999
Air
2.68
LPCVD
RIE
1.86
900C_3hr
1,530.73999
TE
-3.56
27.549999
99.43
2.07
2.24
4.566
44.450001
59.040001
0.052
1.544
0.918
BATCH_22
Measurement
ring_resonance
0.194
1.24
200.539993
SiO2
1.54
PECVD
Wet Etch
1.81
No_Anneal
1,586.050049
TM
9.36
55.299999
137.399994
12.51
7.302
4.94
63.630001
66.580002
0.221
1.799
0.884
BATCH_20
Measurement
ring_resonance
0.128
1.629
525.210022
Polymer
3.97
LPCVD
Wet Etch
3.27
900C_3hr
1,582.469971
TM
0.87
49.959999
30.02
14.75
8.788
4.896
40.009998
84.550003
0.32
1.706
0.884
BATCH_26
Synthetic
cut-back
0.03
0.676
501.149994
Air
3.87
Sputtering
RIE
2
900C_1hr
1,582.26001
TE
-2.78
78.940002
182.619995
26.58
12.971
4.189
56.84
62.310001
0.011
1.977
0.754
BATCH_41
Synthetic
OTDR
0.116
1.015
387.98999
Polymer
2.76
PECVD
Wet Etch
4.32
900C_3hr
1,558.589966
TM
-0.12
39.060001
85.75
23.940001
13.49
4.921
66.800003
71.269997
0.027
1.648
0.768
BATCH_25
Measurement
ring_resonance
0.161
1.981
500.369995
SiO2
1.45
PECVD
Wet Etch
4.9
900C_3hr
1,515.430054
TE
-5.15
53.77
61.419998
12.96
5.399
2.835
81.720001
86.089996
0.128
1.806
0.865
BATCH_44
Measurement
cut-back
0.113
1.529
202.839996
Polymer
1.75
LPCVD
ICP
1.47
1000C_1hr
1,567.119995
TM
0.01
54.459999
76.400002
19.799999
9.584
4.37
66.580002
87.400002
0.155
1.743
0.853
BATCH_29
Measurement
microring_Q
0.037
0.65
239.919998
Air
4.35
Sputtering
Wet Etch
3.89
No_Anneal
1,579.329956
TM
-3.67
53.049999
105.029999
26.940001
7.314
2.372
41.759998
84.669998
0.172
1.842
0.741
BATCH_10
Synthetic
OTDR
0.104
1.309
355.720001
Polymer
3.61
Sputtering
ICP
2.12
900C_1hr
1,506.140015
TE
-9.38
37.709999
127.330002
39.66
7.538
1.46
49.389999
79.57
0.118
1.647
0.907
BATCH_33
Synthetic
OTDR
0.155
0.717
242.919998
SiO2
4.44
Sputtering
RIE
2.19
No_Anneal
1,564.910034
TM
-9.68
68.5
58.509998
6.2
3.505
3.82
76.209999
76.419998
0.387
1.509
0.829
BATCH_16
Measurement
cut-back
0.063
1.244
242.789993
Polymer
4.2
LPCVD
ICP
0.87
900C_3hr
1,584.349976
TE
-1.94
51.439999
153.279999
8.39
1.615
1.27
81.290001
67.839996
0.018
1.605
0.729
BATCH_14
Measurement
ring_resonance
0.058
1.673
515.090027
Polymer
4.88
LPCVD
Wet Etch
3.39
900C_3hr
1,587.76001
TM
-7.2
75.870003
81.529999
9.51
4.745
3.459
78.300003
44.650002
0.314
1.788
0.829
BATCH_41
Synthetic
ring_resonance
0.198
1.381
401.290009
SiO2
1.34
PECVD
Wet Etch
2.55
900C_1hr
1,556.310059
TM
-2.57
26.07
84.739998
12.22
4.313
2.262
89.040001
55.459999
0.489
1.545
0.877
BATCH_44
Synthetic
microring_Q
0.068
0.986
335.149994
SiO2
1.48
PECVD
Wet Etch
3.35
No_Anneal
1,507.369995
TE
-9.14
22.219999
112.029999
5.12
2.255
1.827
70.230003
59.689999
0.022
1.919
0.878
BATCH_49
Synthetic
ring_resonance
0.059
0.874
577.780029
SiO2
1.79
PECVD
ICP
2.12
No_Anneal
1,539.77002
TE
-4.59
22.98
192.880005
41.599998
9.747
1.945
68.650002
79.699997
0.398
1.922
0.874
BATCH_18
Measurement
ring_resonance
0.118

SiN Photonic Waveguide Loss & Efficiency Dataset

Description
This dataset provides 90,000 synthetic rows of silicon nitride (Si₃N₄) photonic waveguide parameters, focusing on waveguide loss and efficiency metrics. The data is useful for modeling, simulation, or LLM fine tuning to predict and understand the relationship between fabrication/design parameters and optical performance.

Key Highlights ✨

  • Material Focus: Silicon Nitride (Si₃N₄)
  • Columns: 25 structured columns capturing waveguide geometry, fabrication method, operational conditions, and measured/synthetic performance metrics
  • Size: 90,000 rows (ideal for both training and validation splits)
  • Use Cases:
    • Waveguide loss prediction
    • Process control and optimization
    • Photonic design parameter studies
    • Synthetic data augmentation for AI/ML tasks

Dataset Structure 🏗️

Each row corresponds to a single waveguide configuration or measurement instance, including:

  1. Waveguide Geometry

    • waveguide_width (µm)
    • waveguide_height (nm or µm)
    • bend_radius (µm)
    • device_length (mm)
  2. Material & Fabrication

    • cladding_material
    • cladding_thickness (µm)
    • deposition_method
    • etch_method
    • sidewall_roughness (nm)
    • annealing_params
  3. Operational Parameters

    • wavelength (nm)
    • polarization (TE/TM)
    • input_power (dBm)
    • temperature (°C)
  4. Performance Metrics

    • insertion_loss (dB)
    • propagation_loss (dB/cm)
    • coupling_efficiency_input (%)
    • coupling_efficiency_output (%)
    • scattering_loss (dB/cm)
    • effective_index
    • mode_confinement_factor (0–1)
  5. Metadata

    • batch_id (fabrication batch/wafer ID)
    • data_source (Synthetic or Measurement)
    • measurement_method (e.g., cut-back, ring_resonance)
    • uncertainty (± dB or %)

Example Row

waveguide_width = 1.212
waveguide_height = 400.00
cladding_material = SiO2
cladding_thickness = 2.50
deposition_method = LPCVD
etch_method = RIE
sidewall_roughness = 2.05
annealing_params = 900C_3hr
wavelength = 1552.23
polarization = TE
input_power = 0.00
temperature = 25.00
bend_radius = 50.00
device_length = 10.00
insertion_loss = 3.50
propagation_loss = 0.300
coupling_efficiency_input = 72.00
coupling_efficiency_output = 68.00
scattering_loss = 0.15
effective_index = 1.800
mode_confinement_factor = 0.80
batch_id = BATCH_12
data_source = Synthetic
measurement_method = ring_resonance
uncertainty = 0.05

How to Use 💡

  1. Download/Clone

    • You can download the CSV file manually or use Hugging Face’s datasets library:
      from datasets import load_dataset
      
      dataset = load_dataset("username/SiN_Photonic_Waveguide_Loss_Efficiency")
      
  2. Loading & Exploration

    • Load into your favorite Python environment (pandas, polars, etc.) to quickly explore the data distribution:
      import pandas as pd
      
      df = pd.read_csv("SiN_Photonic_Waveguide_Loss_Efficiency.csv")
      print(df.head())
      
  3. Model Training

    • For tasks like waveguide loss prediction, treat the waveguide geometry/fabrication columns as input features, and the insertion_loss or propagation_loss columns as the labels or targets.
    • Example ML scenario:
      features = df[[
          "waveguide_width", "waveguide_height", "sidewall_roughness", 
          "wavelength", "polarization", "temperature"
      ]]
      target = df["propagation_loss"]
      
      # Then train a regression model, e.g., scikit-learn, XGBoost, etc.
      
  4. Synthetic Data Augmentation

    • Use this synthetic dataset to supplement smaller real datasets

Caveats & Limitations ⚠️

  • Synthetic Nature: While ranges are inspired by real-world photonic designs, actual values may differ based on specific foundries, tools, and processes.
  • Statistical Simplifications: Not all real-world correlations or distributions (e.g., non-uniform doping profiles, advanced thermal effects) are captured.
  • Measurement Noise: The uncertainty column does not fully replicate complex measurement artifacts.

License 📄

This dataset is available under the MIT License. You are free to modify, distribute, and use it for commercial or non-commercial purposes—just provide attribution.

Citation & Acknowledgments 🙌

If you use this dataset in your research or applications, please cite it as follows (example citation):

Author: https://huggingface.co/Taylor658
Title: SiN Photonic Waveguide Loss & Efficiency (Synthetic)
Year: 2025

@misc{sin_waveguide_loss_efficiency_2025,
  title  = {SiN Photonic Waveguide Loss & Efficiency (Synthetic)},
  author = {atayloraeropsace},
  year   = {2025},
  howpublished = {\url{https://huggingface.co/datasets/username/SiN_Photonic_Waveguide_Loss_Efficiency}}
}

Contributing 🧑‍💻

We welcome community contributions, ideas, and corrections:

  • Add additional columns (e.g., doping profiles, stress levels, advanced measurement data).

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